Hans-Jürgen Engelmann
Beate Volkmann
Yvonne Ritz
H. Stegmann
Prof. Dr.-Ing. Holger Saage
Quentin deRobillard
E. Zschech

Microscopy Today

2003

2003/11

2

22-25

Zeitschriften-/Journalbeitrag (peer-reviewed)

https://doi.org/10.1017/S1551929500052457

Engelmann, Hans-Jürgen; Volkmann, Beate; Ritz, Yvonne; Saage, Holger; Stegmann, H.; deRobillard, Quentin; Zschech, E. (2003): TEM sample preparation using focused ion beam - capabilities and limits. Microscopy Today 2003/11 (2), S. 22-25. DOI: 10.1017/S1551929500052457

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